상세설명
| PF-D81 Furnace System |
| Semiconductor Process Application - Wet/Dry Oxidation - N2/H2 Sinter - Anneal - Poly - Nitride - HTO |
PF-D81 Series System Features
-Wafer size : 125mm,150mm, 200mm
- Load Capacity : 75 Wafers
- Thermal uniformity accuracy :
* Between 400℃ and 800℃ ±1℃
* Between 800℃ and 1150℃ ±0.5℃
- Ramp rate : 0.1~ 25℃ per minute
- Thermal uniformity accuracy :
* Between 400℃ and 800℃ ±1℃
* Between 800℃ and 1150℃ ±0.5℃
- Ramp rate : 0.1~ 25℃ per minute
- Operating temperature range : 400℃ ~ 1150℃
- Boat Speed : 3~125 cm / minute
- 3 Zone by Spikes and Profile T/C
- Boat Speed : 3~125 cm / minute
- 3 Zone by Spikes and Profile T/C
