Model
EKF-000
ECL-000
EAF-000
Wave length
248 nm
308 nm
193 nm
Gas
KrF
XeCl
ArF
Repetion rate(Hz)
50, 100, 500, 1000
Energy/pulse (mJ)
10, 30, 50, 100. 500, 1000
Cooling
1st water, 2nd air or water
Weight
chamber : ≤ 100 kg
Dimension
723(L) x 244(w) x 194(H)
- Excimer laser for semiconductor exposure step
- Applied to LCD production line.