- Etch, CVD (MO, PE, HDP, LP)Implant, Sputtering
- Nanotechnology process with high particulate levels
- Thin film photovoltaic panels
** Features
- Protects process environment from back-streaming powder in the event of dry pump failure
- Reduces expensive down time in powder producing process
Fast pneumatic actuation-closes in <0.5 seconds(Normal 0.7seconds)
- Long cycle life under adverse process conditions
** Options
- Available with either ISO 100-K or ISO 160-K flanges
- 1, 2, 3 or 4 channel options