상세설명
SPECIFICATIONS
| Application | In situ one side or double side metal coating. |
|---|---|
| Deposition materials | Metal materials- Ag, Cu, Ni, Ti,… |
| Substrate size | Piece to 4 inch, Rectangular type |
| Product yield | Depending on sample size |
| Sputter gun size | Small to 800mm*150mm*10mm(T) |
| No. of sputter gun | Up to 4 nos |
| Plasma power | RF, DC or Pulsed DC power |
| Pressure control | Auto pressure control (throttle valve and baratron gauge) |
| Process gases | Ar, O2, N2 |
| Vacuum pump | TMP, Cryo pump or Diffusion pump + Rotary pump or Dry pump |
| Ultimate pressure | < 5.0E-7 Torr |
| Option | Double site metal coating, Plasma cleaning |
| Control | PC control (UPRO software) or Manual |
