상세설명
General Atomizing Device]
- Gas Atomizing System
: 15~1000kg/batch, 분사압 max 60bar, Vacuum가능
- Water Atomizing System
: 100~2000kg/batch, 분사압 max 1500bar, Vacuum가능
- Plasma Spray Atomizing System (max. 100kg/batch)
- Centrifugal Atomizing System (max. 100kg/batch)
