상세설명
- Vacuum Environment Wafer Handling Robot (FPD)
- Features
• Few outgoing gas hands making it light
• Performance is steady by making the joint Unit secured
• Can be applied to 3xLL by Longer Z stroke
• Controller is small and light and maintenance is easy
• An original cooling system corresponds to a high temperature environment
• Easy separation of Runit & Manipulator makes maintenance & installation simple.
• Arm transportation that uses high accuracy parts and high Bullitt belts
• High straight advancement is secured by assuming Runit to be a linear drive
